JPS5329574B2 - - Google Patents
Info
- Publication number
- JPS5329574B2 JPS5329574B2 JP1497576A JP1497576A JPS5329574B2 JP S5329574 B2 JPS5329574 B2 JP S5329574B2 JP 1497576 A JP1497576 A JP 1497576A JP 1497576 A JP1497576 A JP 1497576A JP S5329574 B2 JPS5329574 B2 JP S5329574B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1497576A JPS5299072A (en) | 1976-02-16 | 1976-02-16 | Mask for x-ray exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1497576A JPS5299072A (en) | 1976-02-16 | 1976-02-16 | Mask for x-ray exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5299072A JPS5299072A (en) | 1977-08-19 |
| JPS5329574B2 true JPS5329574B2 (en]) | 1978-08-22 |
Family
ID=11875969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1497576A Granted JPS5299072A (en) | 1976-02-16 | 1976-02-16 | Mask for x-ray exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5299072A (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5577637A (en) * | 1978-12-06 | 1980-06-11 | Toshiba Corp | Ignition control circuit |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5950443A (ja) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | Ｘ線マスク |
| JPS60168145A (ja) * | 1984-02-13 | 1985-08-31 | Nec Corp | Ｘ線露光マスク |
| JPH04269832A (ja) * | 1991-02-26 | 1992-09-25 | Shin Etsu Chem Co Ltd | Ｘ線リソグラフィ−用マスクの製造方法 |
| JP6323873B2 (ja) * | 2014-08-13 | 2018-05-16 | 国立研究開発法人産業技術総合研究所 | 軟ｘ線を用いた二次電池オペランド測定用電極 |
-
1976
- 1976-02-16 JP JP1497576A patent/JPS5299072A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5577637A (en) * | 1978-12-06 | 1980-06-11 | Toshiba Corp | Ignition control circuit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5299072A (en) | 1977-08-19 |